共 50 条
- [31] POLY(BUTENE-1 SULFONE) - HIGHLY SENSITIVE POSITIVE RESIST JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1294 - 1296
- [32] ANALYSIS BY ELECTRON ENERGY-LOSS SPECTROSCOPY OF POLY(METHYLMETHACRYLATE) ELECTRON-BEAM RESIST JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2254 - 2258
- [34] SYNTHESIS OF POLYMER MATERIALS BY LOW-ENERGY ELECTRON-BEAM .10. EFFECTS OF ELECTRON-BEAM IRRADIATION ON POLY(BUTYLENE ADIPATE)DIOL RADIATION PHYSICS AND CHEMISTRY, 1989, 33 (05): : 461 - 464
- [36] POLY(METHACRYLIC ANHYDRIDE) POSITIVE ELECTRON-BEAM RESIST JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (01): : 68 - 72
- [37] Monte Carlo simulation of low-energy electron beam exposure in resist Weixi Jiagong Jishu/Microfabrication Technology, 2004, (04):
- [38] Edge roughness study of chemically amplified resist in low-energy electron-beam lithography using computer simulation Nakasugi, T., 1600, Japan Society of Applied Physics (41):
- [39] Edge roughness study of chemically amplified resist in low-energy electron-beam lithography using computer simulation JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6B): : 4157 - 4162
- [40] IMMOBILIZATION OF ENZYME AND ANTIBODY BY LOW-ENERGY ELECTRON-BEAM POLYMERIZATION RADIATION PHYSICS AND CHEMISTRY, 1987, 30 (04): : 263 - 270