LASER-INDUCED LOCAL ETCHING OF GALLIUM-ARSENIDE IN GAS ATMOSPHERE

被引：16
|
作者：
TAKAI, M
TOKUDA, J
NAKAI, H
GAMO, K
NAMBA, S
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1983年 / 22卷 / 12期
关键词：
D O I：
10.1143/JJAP.22.L757
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L757 / L759
页数：3
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