CESIUM ION SPUTTERING OF ALUMINUM

被引：18

作者：

ANDREWS, AE

HASSELTINE, EH

OLSON, NT

SMITH, HP

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1966年 / 37卷 / 09期

关键词：

D O I：

10.1063/1.1708860

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3344 / +

页数：1

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