EFFECT OF LASER-INDUCED DISSOCIATION DURING MEASUREMENTS OF HYDROGEN-ATOMS IN SILANE PLASMAS USING 2-PHOTON-EXCITED LASER-INDUCED FLUORESCENCE

被引：8
作者：
PARK, WZ
TANIGAWA, M
KAJIWARA, T
MURAOKA, K
MASUDA, M
OKADA, T
MAEDA, M
SUZUKI, A
MATSUDA, A
机构：
[1] ELECTROTECH LAB,TSUKUBA 305,JAPAN
[2] KYUSHU UNIV,FAC ENGN,DEPT ELECT ENGN,FUKUOKA 812,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 9A期
关键词：
SILANE PLASMA; LASER-INDUCED DISSOCIATION; HYDROGEN ATOM; DENSITY DISTRIBUTION; 2-PHOTON EXCITATION; LYMAN BETA TRANSITION; AMORPHOUS SILICON;
D O I：
10.1143/JJAP.31.2917
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
During measurements of atomic hydrogen in a silane plasma using two-photon-excited laser-induced fluorescence, laser-induced dissociation of the gas was observed. This was investigated until conditions for the input laser fluence were determined where the effect was negligible. A measurement of the atomic hydrogen distribution was then performed within the limits of these conditions.
引用
收藏
页码：2917 / 2918
页数：2
相关论文
共 6 条
  • [1] PARTICULATES IN ALUMINUM SPUTTERING DISCHARGES
    JELLUM, GM
    GRAVES, DB
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (10) : 6490 - 6496
  • [2] APPLICATION OF LASER FLUORESCENCE SPECTROSCOPY BY 2-PHOTON EXCITATION INTO ATOMIC-HYDROGEN DENSITY-MEASUREMENT IN REACTIVE PLASMAS
    KAJIWARA, T
    TAKEDA, K
    KIM, HJ
    PARK, WZ
    OKADA, T
    MAEDA, M
    MURAOKA, K
    AKAZAKI, M
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1990, 29 (01): : L154 - L156
  • [3] KIM HJ, 1989, KAKUYUGO KENKYU, V61, P170
  • [4] FORMATION KINETICS AND CONTROL OF MICROCRYSTALLITE IN MU-C-SI-H FROM GLOW-DISCHARGE PLASMA
    MATSUDA, A
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) : 767 - 774
  • [5] GUIDING PRINCIPLE IN THE PREPARATION OF HIGH-PHOTOSENSITIVE HYDROGENATED AMORPHOUS SI-GE ALLOYS FROM GLOW-DISCHARGE PLASMA
    MATSUDA, A
    KOYAMA, M
    IKUCHI, N
    IMANISHI, Y
    TANAKA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (01): : L54 - L56
  • [6] ROLE OF HYDROGEN-ATOMS IN THE FORMATION PROCESS OF HYDROGENATED MICROCRYSTALLINE SILICON
    NOMOTO, K
    URANO, Y
    GUIZOT, JL
    GANGULY, G
    MATSUDA, A
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (08): : L1372 - L1375
1