COMPUTER MODELING OF CHEMICAL VAPOR-DEPOSITION KINETICS

被引：0

作者：

ZAWADZKI, AG

GORDON, RG

机构：

[1] UNIV COLORADO,DEPT CHEM,BOULDER,CO 80309

[2] HARVARD UNIV,DEPT CHEM,CAMBRIDGE,MA 02138

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1984年 / 188卷 / AUG期

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：96 / PHYS

共 50 条

[1] KINETICS OF CHEMICAL VAPOR-DEPOSITION
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