DETECTING SUB-MICRON PATTERN DEFECTS ON OPTICAL PHOTOMASKS USING AN ENHANCED EL-3 ELECTRON-BEAM LITHOGRAPHY TOOL

被引：0
作者：
SIMPSON, RA
DAVIS, DE
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来源：
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1982年 / 334卷
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O43 [光学];
学科分类号：
070207 ; 0803 ;
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页码：230 / 237
页数：8
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