AGGREGATION EQUILIBRIA IN ARSENIC DOPED SILICON

被引:2
|
作者
DERDOUR, M
FURLAN, G
NOBILI, D
机构
[1] INT CTR THEORET PHYS,I-34100 TRIESTE,ITALY
[2] CNR,IST LAMEL,I-40126 BOLOGNA,ITALY
[3] UNIV TRIESTE,DEPT THEORET PHYS,I-34127 TRIESTE,ITALY
关键词
D O I
10.1016/0927-0248(94)90107-4
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Carrier density profile determinations are reported which confirm that a mass action relation holds between the ionized and the inactive mobile As in silicon. Experiments were performed under equilibrium conditions at temperatures in the range 780-885-degrees-C. The carrier density n versus the dopant concentration N(T) exhibits a very pronounced saturation behaviour which is compared with the one expected in well known cluster models. These results complement the recent finding that the inactive As can exist in equilibrium with the monoclinic SiAs. From this information and previous SAXS, TEM, and EXAFS results one can conclude that a pre-precipitation phenomenon, with its inherent cluster distribution, is responsible for the inactive As.
引用
收藏
页码:435 / 441
页数:7
相关论文
共 50 条
  • [1] PRECIPITATION, AGGREGATION, AND DIFFUSION IN HEAVILY ARSENIC-DOPED SILICON
    NOBILI, D
    SOLMI, S
    PARISINI, A
    DERDOUR, M
    ARMIGLIATO, A
    MORO, L
    PHYSICAL REVIEW B, 1994, 49 (04): : 2477 - 2483
  • [2] ABSORPTION SPECTRUM OF ARSENIC DOPED SILICON
    HROSTOWSKI, HJ
    KAISER, RH
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1958, 7 (2-3) : 236 - 239
  • [3] ARSENIC DIFFUSION IN SILICON FROM DOPED POLYCRYSTALLINE SILICON
    MUROTA, J
    ARAI, E
    KOBAYASHI, K
    KUDO, K
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (02) : 457 - 458
  • [4] Arsenic Precipitation in Heavily Arsenic-Doped Czochralski Silicon
    Wu, Defan
    Zhao, Tong
    Ye, Bin
    Liang, Xingbo
    Chen, Hao
    Nie, Qunlin
    Tian, Daxi
    Yang, Deren
    Ma, Xiangyang
    PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2023, 17 (03):
  • [5] Deactivation in heavily arsenic-doped silicon
    Berding, MA
    Sher, A
    van Schilfgaarde, M
    Rousseau, PM
    Spicer, WE
    APPLIED PHYSICS LETTERS, 1998, 72 (12) : 1492 - 1494
  • [6] Deactivation in heavily arsenic-doped silicon
    Appl Phys Lett, 12 (1492):
  • [7] MECHANISM OF ARSENIC DIFFUSION INTO SILICON FROM ARSENIC-DOPED OXIDE SOURCE
    BEYER, KD
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (04) : 630 - 632
  • [8] DIFFUSION INTO SILICON FROM AN ARSENIC-DOPED OXIDE
    LEE, DB
    SOLID-STATE ELECTRONICS, 1967, 10 (06) : 623 - &
  • [9] Complex dynamical phenomena in heavily arsenic doped silicon
    Ramamoorthy, M
    Pantelides, ST
    PHYSICAL REVIEW LETTERS, 1996, 76 (25) : 4753 - 4756
  • [10] Deactivation kinetics in heavily arsenic-doped silicon
    CNR-LAMEL Institute, 101- 40129 Bologna, Italy
    不详
    不详
    不详
    J Electrochem Soc, 11 (4246-4252):