TEXTURED ZNO THIN-FILMS FOR SOLAR-CELLS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：140
作者：
WENAS, WW
YAMADA, A
KONAGAI, M
TAKAHASHI, K
机构：
[1] Tokyo Institute of Technology, Department of Electrical and Electronic Engineering, Meguro-ku, Tokyo, 152
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1991年 / 30卷 / 3B期
关键词：
MOCVD; ZNO; HAZE; TRANSPARENT CONDUCTING OXIDE;
D O I：
10.1143/JJAP.30.L441
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Textured ZnO films have been grown by metalorganic chemical vapor deposition (MOCVD) using diethylzinc (DEZ) and H2O as reactant gases. It was found that the surface morphology of films was strongly dependent on the substrate temperature. For the low substrate temperature of 150-degrees-C, the surface consists of uniformly sized tetrapodlike features. These undoped films have a high transparency in a wide wavelength range from 400 nm to 1400 nm. The low-resistivity ZnO films have also been successfully grown using a dopant gas of B2H6 diluted with H2. A sheet resistivity as low as 10 OMEGA/square was obtained.
引用
收藏
页码：L441 / L443
页数：3
相关论文
共 50 条
  • [41] PROPERTIES OF METALORGANIC PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF OXIDE SUPERCONDUCTORS
    ZAMA, H
    ODA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (07): : L1072 - L1074
  • [42] Magnesium incorporation efficiencies in MgxZn1-xO films on ZnO substrates grown by metalorganic chemical vapor deposition
    Hu, Qi-Chang
    Ding, Kai
    CHINESE PHYSICS B, 2017, 26 (06)
  • [43] Magnesium incorporation efficiencies in MgxZn1-xO films on ZnO substrates grown by metalorganic chemical vapor deposition
    胡启昌
    丁凯
    Chinese Physics B, 2017, 26 (06) : 465 - 470
  • [44] Low temperature growth of oxide thin films by metalorganic chemical vapor deposition
    Yom, SS
    INTEGRATED FERROELECTRICS, 1998, 20 (1-4) : 55 - 64
  • [45] Metalorganic chemical vapor deposition of lanthanum aluminate thin films for gate dielectrics
    Li, AD
    Cheng, JB
    Shao, QY
    Ling, HQ
    Wu, D
    Wang, Y
    Wang, M
    Liu, ZG
    Ming, NB
    Wang, C
    Zhou, HW
    Nguyen, B
    FERROELECTRICS, 2005, 329 : 977 - 981
  • [46] ZnO thin film grown on glass by metal-organic chemical vapor deposition
    Ma, X. M.
    Yang, X. T.
    Wang, C.
    Yang, J.
    Gao, X. H.
    Liu, J. E.
    Jing, H.
    Du, G. T.
    Liu, B. Y.
    Ma, K.
    2008 2ND IEEE INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1-3, 2008, : 833 - 835
  • [47] Metalorganic chemical vapor deposition of conductive CaRuO3 thin films
    Higashi, N
    Okuda, N
    Funakubo, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (5A): : 2780 - 2783
  • [48] CARBON-TETRACHLORIDE DOPED ALXGA1-XAS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    CUNNINGHAM, BT
    BAKER, JE
    STILLMAN, GE
    JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (04) : 331 - 335
  • [49] Concentration quenching in Eu-doped ZnO grown by sputtering-assisted metalorganic chemical vapor deposition
    Tsuji, Takahiro
    Terai, Yoshikazu
    Bin Kamarudin, Muhammad Hakim
    Yoshida, Kazuki
    Fujiwara, Yasufumi
    JOURNAL OF LUMINESCENCE, 2012, 132 (12) : 3125 - 3128
  • [50] Photoluminescence properties of Eu-Doped ZnO grown by sputtering-assisted metalorganic chemical vapor deposition
    Terai Y.
    Yoshida K.
    Fujiwara Y.
    Zairyo/Journal of the Society of Materials Science, Japan, 2010, 59 (09) : 690 - 693
12345