TEXTURED ZNO THIN-FILMS FOR SOLAR-CELLS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：140
作者：
WENAS, WW
YAMADA, A
KONAGAI, M
TAKAHASHI, K
机构：
[1] Tokyo Institute of Technology, Department of Electrical and Electronic Engineering, Meguro-ku, Tokyo, 152
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1991年 / 30卷 / 3B期
关键词：
MOCVD; ZNO; HAZE; TRANSPARENT CONDUCTING OXIDE;
D O I：
10.1143/JJAP.30.L441
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Textured ZnO films have been grown by metalorganic chemical vapor deposition (MOCVD) using diethylzinc (DEZ) and H2O as reactant gases. It was found that the surface morphology of films was strongly dependent on the substrate temperature. For the low substrate temperature of 150-degrees-C, the surface consists of uniformly sized tetrapodlike features. These undoped films have a high transparency in a wide wavelength range from 400 nm to 1400 nm. The low-resistivity ZnO films have also been successfully grown using a dopant gas of B2H6 diluted with H2. A sheet resistivity as low as 10 OMEGA/square was obtained.
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页码：L441 / L443
页数：3
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