X-RAY EXTINCTION CONTRAST TOPOGRAPHY OF SILICON STRAINED BY THIN SURFACE FILMS

被引：62

作者：

MEIERAN, ES

BLECH, IA

机构：

来源：

关键词：

D O I：

10.1063/1.1702943

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3162 / &

共 14 条

[1]

[Anonymous], INSTRUCTION MANUAL

[2] DYNAMICAL DIFFRACTION OF X RAYS BY PERFECT CRYSTALS [J].

BATTERMAN, BW ;

COLE, H .

[3]

BLECH IA, TO BE PUBLISHED

[4]

Bonse U., 1962, DIRECT OBSERVATION I, P431

[5] *DIE ABSORPTION VON RONTGENSTRAHLEN IM FALL DER INTERFERENZ [J].

BORRMANN, G .

ZEITSCHRIFT FUR PHYSIK, 1950, 127 (04) :297-323

[6]

HIRSCH PB, 1960, 4 INT C EL MICR, P527

[7]

Jenkinson A. E., 1962, DIRECT OBSERVATION I, P471

[8]

LANG AR, 1959, J APPL PHYSICS, V30, P748

[9]

MEIERAN ES, 1965, ADVANCES XRAY ANALYS, V8, P48

[10]

NEWKIRK JB, 1959, T AM I MIN MET ENG, V215, P483