THE ROLE OF METAL AND PASSIVATION DEFECTS IN ELECTROMIGRATION-INDUCED DAMAGE IN THIN-FILM CONDUCTORS

被引：37
作者：
LLOYD, JR
SMITH, PM
PROKOP, GS
机构：
来源：
THIN SOLID FILMS | 1982年 / 93卷 / 3-4期
关键词：
D O I：
10.1016/0040-6090(82)90144-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：385 / 395
页数：11
相关论文
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