INFRARED STUDY OF THE SORPTION OF HSICL3 ON SILICA AND THE STABILITY OF THE CHEMISORBED LAYERS

被引：25
作者：
LOW, MJD
SEVERDIA, AG
CHAN, J
机构：
来源：
JOURNAL OF COLLOID AND INTERFACE SCIENCE | 1982年 / 86卷 / 01期
关键词：
D O I：
10.1016/0021-9797(82)90046-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：111 / 118
页数：8
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