DEPTH-PROFILING OF SURFACE OXIDE FILM METAL SYSTEMS

被引：5

作者：

SEO, M

SATO, N

机构：

来源：

TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS | 1985年 / 26卷 / 10期

关键词：

D O I：

10.2320/matertrans1960.26.747

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：747 / 752

页数：6

共 15 条

[1] DETERMINATION OF QUANTITATIVE SPUTTER RATES OF IRON-OXIDE BY AUGER-ELECTRON SPECTROSCOPY (AES) AND ELLIPSOMETRY
HART, RG
SIMMONS, GW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 714 - 717
[2] DEPTH RESOLUTION AND SURFACE-ROUGHNESS EFFECTS IN SPUTTER PROFILING OF NICR MULTILAYER SANDWICH SAMPLES USING AUGER-ELECTRON SPECTROSCOPY
HOFMANN, S
ERLEWEIN, J
ZALAR, A
[J]. THIN SOLID FILMS, 1977, 43 (03) : 275 - 283
[3] Hofmann S., 1980, Surface and Interface Analysis, V2, P148, DOI 10.1002/sia.740020406
[4] DEPTH RESOLUTION IN SPUTTER PROFILING
HOFMANN, S
[J]. APPLIED PHYSICS, 1977, 13 (02): : 205 - 207
[5] HOFMANN S, 1976, APPL PHYS, V9, P56
[6] ISHITANI T, 1975, APPL PHYS, V6, P241, DOI 10.1007/BF00883758
[7] Kelly R., 1973, Radiation Effects, V19, P39, DOI 10.1080/00337577308232213
[8] COMPOSITION-DEPTH PROFILING USING AUGER-ELECTRON SPECTROSCOPY
LEA, C
[J]. METAL SCIENCE, 1983, 17 (08): : 357 - 367
[9] QUANTITATIVE-ANALYSIS OF THIN OXIDE-FILMS USING X-RAY PHOTOELECTRON-SPECTROSCOPY AND RASTERED ION-BOMBARDMENT
MCINTYRE, NS
ZETARUK, DG
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 181 - 185
[10] MICHELL DF, 1981, J VAC SCI TECH, V18, P690