PHOTOCHEMICAL MIGRATORY APTITUDES IN CYCLOHEXENONES . MECHANISTIC AND EXPLORATORY PHOTOCHEMISTRY .23.

被引：104
作者：
ZIMMERMAN, HE
RIEKE, RD
SCHEFFER, JR
机构：
来源：
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1967年 / 89卷 / 09期
关键词：
D O I：
10.1021/ja00985a012
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：2033 / +
页数：1
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