MODIFICATION OF THE OPTICAL AND STRUCTURAL-PROPERTIES OF DIELECTRIC ZRO2 FILMS BY ION-ASSISTED DEPOSITION

被引:213
作者
MARTIN, PJ
NETTERFIELD, RP
SAINTY, WG
机构
关键词
D O I
10.1063/1.332871
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:235 / 241
页数:7
相关论文
共 20 条
[1]  
ALLEN TH, 1982, P SOC PHOTO-OPT INST, V325, P93, DOI 10.1117/12.933291
[2]   THE FORM BIREFRINGENCE OF MACROMOLECULES [J].
BRAGG, WL ;
PIPPARD, AB .
ACTA CRYSTALLOGRAPHICA, 1953, 6 (11-1) :865-867
[3]   EQUIVALENT REFRACTIVE-INDEX OF MULTILAYER FILMS OF DIFFERENT MATERIALS [J].
CHOPRA, KL ;
SHARMA, SK ;
YADAVA, VN .
THIN SOLID FILMS, 1974, 20 (02) :209-215
[4]   MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION [J].
CUOMO, JJ ;
HARPER, JME ;
GUARNIERI, CR ;
YEE, DS ;
ATTANASIO, LJ ;
ANGILELLO, J ;
WU, CT ;
HAMMOND, RH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :349-354
[5]  
DONOVAN TM, 1980, NBS SPECIAL PUBLICAT, V568, P237
[6]   INFLUENCE OF ION-BOMBARDMENT ON PROPERTIES OF VACUUM-EVAPORATED THIN-FILMS [J].
DUDONIS, J ;
PRANEVICIUS, L .
THIN SOLID FILMS, 1976, 36 (01) :117-120
[7]  
EBERT J, 1982, P SOC PHOTO-OPT INST, V325, P29, DOI 10.1117/12.933283
[8]   AUGER AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF PREFERENTIAL SPUTTERING IN Y2O3-DOPED ZRO2 FILMS [J].
GREENE, JE ;
KLINGER, RE ;
BARR, TL ;
WELSH, LB .
CHEMICAL PHYSICS LETTERS, 1979, 62 (01) :46-50
[9]  
HERRMAN WC, 1980, 11TH P ANN S OPT MAT, P324
[10]   THIN-FILM ANNEALING BY ION-BOMBARDMENT [J].
HIRSCH, EH ;
VARGA, IK .
THIN SOLID FILMS, 1980, 69 (01) :99-105