PLASMA-ASSISTED DEPOSITION PROCESSES - THEORY, MECHANISMS AND APPLICATIONS

被引：56
作者：
THORNTON, JA
机构：
来源：
THIN SOLID FILMS | 1983年 / 107卷 / 01期
关键词：
D O I：
10.1016/0040-6090(83)90003-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：3 / 19
页数：17
相关论文
共 75 条
[1]  
ALLIS W, 1960, PLASMA DYNAMICS, P54
[2]   ULTIMATE AND SECONDARY ELECTRON ENERGIES IN THE NEGATIVE GLOW OF A COLD-CATHODE DISCHARGE IN HELIUM [J].
ANDERSON, JM .
JOURNAL OF APPLIED PHYSICS, 1960, 31 (03) :511-515
[3]   A REVIEW OF RECENT WORK ON HARD I-C FILMS [J].
ANDERSSON, LP .
THIN SOLID FILMS, 1981, 86 (2-3) :193-200
[4]   FLUORINE DOPING OF IN2O3 FILMS EMPLOYING ION-PLATING TECHNIQUES [J].
AVARITSIOTIS, JN ;
HOWSON, RP .
THIN SOLID FILMS, 1981, 80 (1-3) :63-66
[5]   DEPOSITION OF POLYMER-FILMS IN LOW-PRESSURE REACTIVE PLASMAS [J].
BIEDERMAN, H .
THIN SOLID FILMS, 1981, 86 (2-3) :125-135
[6]   DISSOCIATIVE ATTACHMENT OF ELECTRONS IN IODINE .1. MICROWAVE DETERMINATION OF THE ABSOLUTE CROSS SECTION AT 300-DEGREES-K [J].
BIONDI, MA .
PHYSICAL REVIEW, 1958, 109 (06) :2005-2007
[7]  
BONIFIELD TD, 1982, DEPOSITION TECHNOLOG, P365
[8]  
BROWN SC, 1959, BASIC DATA PLASMA PH, P149
[9]   ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS [J].
BUNSHAH, RF ;
RAGHURAM, AC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1385-&
[10]  
BUNSHAH RF, 1982, DEPOSITION TECHNOLOG, P83
12345678