RECOMMENDED VALUES FOR THE THERMAL EXPANSIVITY OF SILICON FROM 0-K TO 1000-K

被引：179

作者：

SWENSON, CA ^{[1
]}

机构：

[1] IOWA STATE UNIV SCI & TECHNOL,DEPT PHYS,AMES,IA 50011

来源：

JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA | 1983年 / 12卷 / 02期

关键词：

D O I：

10.1063/1.555681

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

收藏

页码：179 / 182

页数：4

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