CHOKING OF ELECTRON FLOW - A MECHANISM OF CURRENT SATURATION IN FIELD-EFFECT TRANSISTORS

被引:71
作者
DYAKONOV, MI [1 ]
SHUR, MS [1 ]
机构
[1] AF IOFFE PHYS TECH INST,ST PETERSBURG 194021,RUSSIA
来源
PHYSICAL REVIEW B | 1995年 / 51卷 / 20期
关键词
D O I
10.1103/PhysRevB.51.14341
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We describe a mechanism of the current saturation in a field-effect transistor (FET) caused by choking of electron flow. The choking occurs when the electron velocity at the drain side of the channel reaches the plasma-wave velocity. This effect is quite similar to the choking of a gas flow in a pipe. This mechanism is an alternative to the well-known mechanism of current saturation caused by the drift velocity saturation in the FET channel. We show that the choking mechanism may dominate in a submicrometer AlxGa1-xAs/GaAs FET at 10 K and low drain and gate bias voltages. © 1995 The American Physical Society.
引用
收藏
页码:14341 / 14345
页数:5
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