DETERMINATION OF THE FOWLER-NORDHEIM TUNNELING BARRIER FROM NITRIDE TO OXIDE IN OXIDE - NITRIDE DUAL DIELECTRIC

被引：18
作者：
YAU, LD
机构：
来源：
IEEE ELECTRON DEVICE LETTERS | 1986年 / 7卷 / 06期
关键词：
D O I：
10.1109/EDL.1986.26402
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：365 / 367
页数：3
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