APPLICATION OF ION-BEAM SPUTTERING FOR HIGH-RESOLUTION ELECTRON-MICROSCOPY

被引：0
|
作者：
KANAYA, K
BABA, N
HAYANO, F
ADACHI, K
机构：
[1] KOGAKUIN UNIV,DEPT ELECTR ENGN,SHINJUKU KU,TOKYO 160,JAPAN
[2] UNIV TOKYO,ENGLISH RES INST,BUNKYO KU,TOKYO 113,JAPAN
来源：
JOURNAL OF ELECTRON MICROSCOPY | 1985年 / 34卷 / 03期
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中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
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页码：233 / 233
页数：1
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