RESISTS FOR ELECTRON-BEAM LITHOGRAPHY

被引：0
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作者：
TAMAMURA, T
IMAMURA, S
SUGAWARA, S
机构：
来源：
ACS SYMPOSIUM SERIES | 1984年 / 242卷
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暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：103 / 118
页数：16
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