INTEGRATED DATA CONVERSION FOR THE ELECTRON-BEAM EXPOSURE SYSTEM EX-7

被引：6
|
作者：
KOYAMA, K [1 ]
IKENAGA, O [1 ]
ABE, T [1 ]
YOSHIKAWA, R [1 ]
TAKIGAWA, T [1 ]
WATANABE, S [1 ]
机构：
[1] TOSHIBA CORP,CTR SEMICOND SYST ENGN,SAIWAI KU,KAWASAKI 210,JAPAN
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期
关键词：
D O I：
10.1116/1.584112
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：2061 / 2065
页数：5
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