MONTE-CARLO SIMULATION OF THE PARTICLE-TRANSPORT PROCESS IN SPUTTER DEPOSITION

被引:99
作者
MOTOHIRO, T
TAGA, Y
机构
关键词
D O I
10.1016/0040-6090(84)90493-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:161 / 173
页数:13
相关论文
共 24 条
[1]   EVAPORATED FILM PROFILES OVER STEPS IN SUBSTRATES [J].
BLECH, IA .
THIN SOLID FILMS, 1970, 6 (02) :113-&
[2]  
BLECH IA, 1978, J VAC SCI TECHNOL, V15, P12
[3]   SELECTIVE THERMALIZATION IN SPUTTERING TO PRODUCE HIGH TC FILMS [J].
CADIEU, FJ ;
CHENCINSKI, N .
IEEE TRANSACTIONS ON MAGNETICS, 1975, MA11 (02) :227-230
[4]  
Chapman B., 1980, GLOW DISCHARGE PROCE
[5]  
DUSHMAN S, 1962, SCI F VACUUM TECHNIQ
[6]   VARIATION OF TC OF SPUTTERED NB3GE [J].
GHOSH, AK ;
PENDRYS, L ;
DOUGLASS, DH .
IEEE TRANSACTIONS ON MAGNETICS, 1975, MA11 (02) :225-226
[7]   TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS [J].
HARPER, JME ;
CUOMO, JJ ;
KAUFMAN, HR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :737-756
[8]  
KANG HJ, 1983, SURF SCI, V127, pL179, DOI 10.1016/0039-6028(83)90034-1
[9]   DOMINANT CONTRIBUTION OF PREFERENTIAL RE-SPUTTERING EFFECT ON PERPENDICULAR UNIAXIAL ANISOTROPY IN AMORPHOUS GD-CO FILMS [J].
KATAYAMA, T ;
KOIZUMI, Y ;
HIRANO, M ;
TSUSHIMA, T .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1977, 42 (03) :1057-1058
[10]   THERMALIZATION OF SPUTTERED ATOMS [J].
MEYER, K ;
SCHULLER, IK ;
FALCO, CM .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) :5803-5805