TUNGSTEN SILICIDE FILMS DEPOSITED BY SIH2CL2-WF6 CHEMICAL-REACTION

被引：18
|
作者：
HARA, T
MIYAMOTO, T
YOKOYAMA, T
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 04期
关键词：
D O I：
10.1149/1.2096848
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1177 / 1180
页数：4
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