ELECTROMIGRATION IN ALUMINUM FILMS AT LOW-TEMPERATURES

被引：0
|
作者：
HOLDEMAN, LB [1 ]
机构：
[1] STANFORD UNIV,STANFORD,CA
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1974年 / 19卷 / 05期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
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页码：686 / 686
页数：1
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