RAMAN STUDIES OF THE HIGH-TC COMPOUNDS NB3(AL-GE) AND V3SI

被引：3
作者：
HACKL, R
KAISER, R
MULLER, A
WEBER, W
机构：
[1] SIEMENS AG,RES LABS,D-8520 ERLANGEN,FED REP GER
[2] KERNFORSCHUNGSZENTRUM KARLSRUHE GMBH,INST NUKL FESTKORPERPHYS,D-7500 KARLSRUHE 1,FED REP GER
来源：
JOURNAL OF PHYSICS F-METAL PHYSICS | 1986年 / 16卷 / 09期
关键词：
D O I：
10.1088/0305-4608/16/9/022
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1299 / 1306
页数：8
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