2-DIMENSIONAL PROFILING USING SECONDARY ION MASS-SPECTROMETRY

被引:21
|
作者
DOWSETT, MG
COOKE, GA
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 01期
关键词
D O I
10.1116/1.586358
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As device dimensions decrease and packing densities increase, the need for accurate mapping of dopant profiles in at least two dimensions is becoming ever more acute. Such data are required to establish the limitations of very large scale integrated manufacture, and to verify and refine the process simulators which have been devised. However, direct measurements of dopant atom distributions, using analytical techniques such as secondary ion mass spectrometry, are not possible owing to the limited analyte volume available at high spatial resolutions. The technique described here uses a specially fabricated sample which allows material to be collected from a large number of similar volumes, thus improving the sensitivity. The geometry magnifies the lateral spread many times increasing the lateral resolution achieved with a probe of a given diameter. Relatively low energy probes may be used to obtain high depth resolutions. In subsequent processing, sensitivity, depth, and lateral resolution may be mutually traded to optimize the profile for a given application.
引用
收藏
页码:353 / 357
页数:5
相关论文
共 50 条
  • [41] 3-DIMENSIONAL CHARACTERIZATION OF CONDUCTING POLYMER ARRAYS USING SECONDARY ION MASS-SPECTROMETRY
    GRAY, KH
    GOULD, S
    LEASURE, RM
    MUSSELMAN, IH
    LEE, JJ
    MEYER, TJ
    LINTON, RW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1992, 10 (04): : 2679 - 2684
  • [42] A NOVEL ION IMAGER FOR SECONDARY ION MASS-SPECTROMETRY
    MATSUMOTO, K
    YURIMOTO, H
    KOSAKA, K
    MIYATA, K
    NAKAMURA, T
    SUENO, S
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (01) : 82 - 85
  • [43] A MECHANISM OF ION PRODUCTION IN SECONDARY ION MASS-SPECTROMETRY
    KIDWELL, DA
    ROSS, MM
    COLTON, RJ
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1987, 78 : 315 - 328
  • [44] SECONDARY ION MASS-SPECTROMETRY DEPTH PROFILING OF MO/SIO2/SI STRUCTURAL SAMPLES
    FUJINAGA, K
    KAWASHIMA, I
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1988, 6 (02): : 213 - 216
  • [45] STRUCTURAL CHARACTERIZATION OF REACTIVE DYES USING LIQUID SECONDARY-ION MASS-SPECTROMETRY TANDEM MASS-SPECTROMETRY
    RICHARDSON, SD
    THRUSTON, AD
    MCGUIRE, JM
    WEBER, EJ
    ORGANIC MASS SPECTROMETRY, 1993, 28 (05): : 619 - 625
  • [46] STRUCTURAL CHARACTERIZATION OF SULFONATED AZO DYES USING LIQUID SECONDARY ION MASS-SPECTROMETRY TANDEM MASS-SPECTROMETRY
    RICHARDSON, SD
    MCGUIRE, JM
    THRUSTON, AD
    BAUGHMAN, GL
    ORGANIC MASS SPECTROMETRY, 1992, 27 (03): : 289 - 299
  • [47] SECONDARY ION MASS-SPECTROMETRY - A MULTIDIMENSIONAL TECHNIQUE
    COLTON, RJ
    KIDWELL, DA
    RAMSEYER, GO
    ROSS, MM
    ACS SYMPOSIUM SERIES, 1985, 291 : 160 - 193
  • [48] RECENT ADVANCES IN SECONDARY ION MASS-SPECTROMETRY
    EVANS, CA
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1979, (APR): : 127 - 127
  • [49] MATRIX EFFECTS IN SECONDARY ION MASS-SPECTROMETRY
    BUSCH, KL
    HSU, BH
    XIE, YX
    COOKS, RG
    ANALYTICAL CHEMISTRY, 1983, 55 (07) : 1157 - 1160
  • [50] SECONDARY ION MASS-SPECTROMETRY FOR CERAMIC MATERIALS
    BORCHARDT, G
    MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK, 1990, 21 (03) : 140 - 141