REACTIVE AND NONREACTIVE ION MIXING OF TI FILMS ON CARBON SUBSTRATES

[1] AUCIELLO O, 1984, ION BOMBARDMENT MODI, P12

[2] ION-BEAM BONDING OF THIN-FILMS [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) : 881 - 885

[3] THIN-FILM ADHESION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 106 - 113

[4] CRANMER DC, 1986, ADV CERAM MATER, V1, P247

[5] OXIDATION OF TI SILICIDE SURFACES [J]. SURFACE SCIENCE, 1985, 152 (APR) : 1113 - 1122

[6] CHARACTERIZATION OF AMORPHOUS SIOX LAYERS WITH ESCA [J]. SURFACE SCIENCE, 1985, 162 (1-3) : 671 - 679

[7] OXIDE BOND-ENERGIES FOR THE CALIBRATION OF MATRIX EFFECTS IN SECONDARY ION MASS-SPECTROMETRY [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1984, 61 (01): : 59 - 70

[8] IMPLANT AND IMPURITY REDISTRIBUTION DURING ION INDUCED TASI2 FORMATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 1 - 9

[9] GENERAL-ASPECTS OF TRACE ANALYTICAL METHODS .8. DISTRIBUTION ANALYSIS OF MAJOR AND TRACE-ELEMENTS THROUGH SEMICONDUCTOR LAYERS OF CHANGING MATRIX USING SECONDARY ION MASS-SPECTROMETRY (SIMS) [J]. PURE AND APPLIED CHEMISTRY, 1987, 59 (02) : 229 - 244

[10] EVALUATION OF MICROHARDNESS AND SCRATCH TESTING FOR OPTICAL COATINGS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 327 - 330

[1] AUCIELLO O, 1984, ION BOMBARDMENT MODI, P12

[2] ION-BEAM BONDING OF THIN-FILMS [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) : 881 - 885

[3] THIN-FILM ADHESION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 106 - 113

[4] CRANMER DC, 1986, ADV CERAM MATER, V1, P247

[5] OXIDATION OF TI SILICIDE SURFACES [J]. SURFACE SCIENCE, 1985, 152 (APR) : 1113 - 1122

[6] CHARACTERIZATION OF AMORPHOUS SIOX LAYERS WITH ESCA [J]. SURFACE SCIENCE, 1985, 162 (1-3) : 671 - 679

[7] OXIDE BOND-ENERGIES FOR THE CALIBRATION OF MATRIX EFFECTS IN SECONDARY ION MASS-SPECTROMETRY [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1984, 61 (01): : 59 - 70

[8] IMPLANT AND IMPURITY REDISTRIBUTION DURING ION INDUCED TASI2 FORMATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 1 - 9

[9] GENERAL-ASPECTS OF TRACE ANALYTICAL METHODS .8. DISTRIBUTION ANALYSIS OF MAJOR AND TRACE-ELEMENTS THROUGH SEMICONDUCTOR LAYERS OF CHANGING MATRIX USING SECONDARY ION MASS-SPECTROMETRY (SIMS) [J]. PURE AND APPLIED CHEMISTRY, 1987, 59 (02) : 229 - 244

[10] EVALUATION OF MICROHARDNESS AND SCRATCH TESTING FOR OPTICAL COATINGS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 327 - 330