AN ANALYTICAL ONE-DIMENSIONAL MODEL FOR LIGHTLY DOPED DRAIN (LDD) MOSFET DEVICES

被引:20
作者
LAI, FSJ [1 ]
SUN, JYC [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1109/T-ED.1985.22419
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:2803 / 2811
页数:9
相关论文
共 13 条
[1]   DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS [J].
DENNARD, RH ;
GAENSSLEN, FH ;
YU, HN ;
RIDEOUT, VL ;
BASSOUS, E ;
LEBLANC, AR .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1974, SC 9 (05) :256-268
[2]   SIMPLE 2-DIMENSIONAL MODEL FOR IGFET OPERATION IN SATURATION REGION [J].
ELMANSY, YA ;
BOOTHROYD, AR .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1977, 24 (03) :254-262
[3]  
Hu C., 1983, International Electron Devices Meeting 1983. Technical Digest, P176
[4]  
LAI FS, UNPUB SOLID STATE EL
[5]  
LAI FS, UNPUB DESIGN CHARACT
[6]  
LAI FS, 1984, 166TH EL SOC M NEW O
[7]  
MULLER RS, 1977, DEVICE ELECTRONICS I
[8]   DESIGN AND CHARACTERISTICS OF THE LIGHTLY DOPED DRAIN-SOURCE (LDD) INSULATED GATE FIELD-EFFECT TRANSISTOR [J].
OGURA, S ;
TSANG, PJ ;
WALKER, WW ;
CRITCHLOW, DL ;
SHEPARD, JF .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) :1359-1367
[9]   A TRANSMISSION-LINE MODEL FOR SILICIDED DIFFUSIONS - IMPACT ON THE PERFORMANCE OF VLSI CIRCUITS [J].
SCOTT, DB ;
HUNTER, WR ;
SCHICHIJO, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (04) :651-661
[10]  
SZE SM, 1981, PHYSICS SEMICONDUCTO