GLOW-DISCHARGE DEPOSITION OF TETRAMETHYLSILANE FILMS

被引：48

作者：

CATHERINE, Y

ZAMOUCHE, A

机构：

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1985年 / 5卷 / 04期

关键词：

D O I：

10.1007/BF00566009

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：353 / 368

页数：16

共 30 条

[1] REACTIVE PLASMA DEPOSITED SIXCYHZ FILMS [J].

CATHERINE, Y ;

TURBAN, G .

THIN SOLID FILMS, 1979, 60 (02) :193-200

[2]

CATHERINE Y, 1983, 9TH INT VAC C MADR

[3]

CHEN KS, 1981, KOBUNSHI RONBUNSHU, V38, P665

[4]

CLIFFORD RP, 1972, J ORGANOMET CHEM, V39, P53

[5] NEUTRAL-FRAGMENT MASS-SPECTRA OF THE TETRAMETHYL COMPOUNDS OF THE GROUP-IVA ELEMENTS [J].

FLESCH, GD ;

SVEC, HJ .

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1981, 38 (2-3) :361-370

[6]

GAMMIE L, 1979, J PHYS CHEM, V83, P24

[7] ELECTRON IMPACT SPECTROSCOPY OF TETRAMETHYLSILICON, -TIN AND -LEAD [J].

HOBROCK, BG ;

KISER, RW .

JOURNAL OF PHYSICAL CHEMISTRY, 1961, 65 (12) :2186-&

[8] COMPARISONS OF GLOW-DISCHARGE POLYMERIZATIONS AMONG TETRAMETHYLSILANE, DIMETHYLDIMETHOXYSILANE, AND TETRAMETHOXYSILANE [J].

INAGAKI, N ;

KOYAMA, M .

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1983, 21 (01) :183-190

[9] GLOW-DISCHARGE POLYMERIZATION OF TRIMETHYLVINYLSILANE AND TETRAMETHYLSILANE [J].

INAGAKI, N ;

TAKI, M .

JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (11) :4337-4343

[10] CHEMICAL IONIZATION MASS-SPECTROMETRY OF SILANE, DISILANE AND METHYLSILANES [J].

KRAUSE, JR ;

POTZINGER, P .

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1975, 18 (04) :303-316

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