High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations

被引：1

作者：

Zhu Boer ^{[1
,2
]}

Li Sikun ^{[1
,2
]}

Wang Xiangzhao ^{[1
,2
]}

Dai Fengzhao ^{[1
,2
]}

Feng, Tang ^{[1
,2
]}

Duan Lifeng ^{[3
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Informat Opt & Optoelect Technol, Shanghai 201800, Peoples R China

[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China

[3] Shanghai Micro Elect Equipment Grp Co Ltd, Shanghai 201203, Peoples R China

来源：

ACTA OPTICA SINICA | 2018年 / 38卷 / 07期

关键词：

measurement; lithography; high-order aberration; multi-polarized illuminations; aerial image; principal component analysis;

D O I：

10.3788/AOS201838.0712004

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A high-order aberration measurement technique for immersion lithography projection lens based on multi polarized illuminations is proposed. Aerial images of different polarized illuminations are collected by linear sampling, and the measurement model is built quickly based on principle component analysis; the high-order aberration of the immersion lithography projection lens is measured accurately. Compared with the high-order aberration measurement method based on a test target with eight angles, the proposed technique can reduce the number of samples, improve the efficiency of sampling, and speed up modeling. The lithographic simulator PROLITH is used to validate the proposed technique and analyze the influence of the illumination types on the accuracy of the high-order aberration measurement. The results show that the proposed technique can retrieve 60 terms of Zernike coefficients (Z(5)-Z(64)) with measurement accuracy better than 1.03 X 10(-3) lambda, and its modeling speed is improved by about 30 times.

引用

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