OPTIMIZATION OF BF2+ IMPLANTED AND RAPIDLY ANNEALED JUNCTIONS IN SILICON

被引：43

作者：

WU, IW

FULKS, RT

MIKKELSEN, JC

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 07期

关键词：

D O I：

10.1063/1.337155

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2422 / 2438

页数：17

共 36 条

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