FAR UV PULSED LASER MELTING OF SILICON

被引:54
作者
GORODETSKY, G [1 ]
KANICKI, J [1 ]
KAZYAKA, T [1 ]
MELCHER, RL [1 ]
机构
[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
关键词
D O I
10.1063/1.95533
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:547 / 549
页数:3
相关论文
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