PHOTOCROSSLINKABLE POLYMERS HAVING PARA-PHENYLENEDIACRYLATE GROUP IN THE SIDE-CHAIN - ARGON-LASER PHOTORESIST

被引：56

作者：

ICHIMURA, K ^{[1
]}

NISHIO, Y ^{[1
]}

机构：

[1] DAINIPPON INK & CHEM INC,ITABASHI KU,TOKYO 174,JAPAN

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1987年 / 25卷 / 06期

关键词：

HOLOGRAPHY; -; Applications; PHOTORESISTS; Synthesis;

D O I：

10.1002/pola.1987.080250612

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Preparative methods and photosensitivity characteristics of polymers bearing the p-phenylene-diacrylate (PDA) group are described. Condensation of a copolymer of methyl methacrylate and glycidyl methacrylate with p-phenylenediacrylic acid monoester gave highly photosensitive polymers. An alternative method to introduce PDA group is the substitution of chloromethyl-styrene polymer with p-phenylenediacrylic acid monoester monoalkali salt. The latter method was found to be more favorable for preparing soluble photosensitive polymers. The polymers thus prepared showed high sensitivity to light of 488 nm from an argon laser when sensitizers are used, and the photocrosslinking quantum efficiency was 0. 44. Preliminary results on holographic recording with this polymer is also mentioned.

引用

页码：1579 / 1590

页数：12

共 24 条

[1] PHOTO-POLYMERIZATION IN CHIRAL CRYSTALS .1. PLANNING AND EXECUTION OF A TOPOCHEMICAL SOLID-STATE ASYMMETRIC SYNTHESIS WITH QUANTITATIVE ASYMMETRIC INDUCTION [J].