HIGHLY CONDUCTIVE AND TRANSPARENT ZINC-OXIDE FILMS PREPARED BY RF MAGNETRON SPUTTERING UNDER AN APPLIED EXTERNAL MAGNETIC-FIELD

被引：190

作者：

MINAMI, T

NANTO, H

TAKATA, S

机构：

来源：

APPLIED PHYSICS LETTERS | 1982年 / 41卷 / 10期

关键词：

D O I：

10.1063/1.93355

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：958 / 960

页数：3

共 7 条

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[2]

CAPORALETTI O, 1981, SOLID STATE COMMUN, V42, P109

[3] HIGH-RATE DEPOSITION OF THICK PIEZOELECTRIC ZNO FILMS USING A NEW MAGNETRON SPUTTERING TECHNIQUE [J].

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APPLIED PHYSICS LETTERS, 1980, 37 (07) :633-635

[4]

NAYER PS, 1981, APPL PHYS LETT, V39, P105

[5] USE OF ZNO IN TRANSPARENT TYPE MIS SOLAR-CELLS [J].

PETROU, P ;

SINGH, R ;

BRODIE, DE .

APPLIED PHYSICS LETTERS, 1979, 35 (12) :930-931

[6] SEMICONDUCTING ZINC-OXIDE FILMS PREPARED BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION FROM DIETHYL ZINC [J].

ROTH, AP ;

WILLIAMS, DF .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (12) :2684-2686

[7] TRANSPARENT AND HIGHLY CONDUCTIVE FILMS OF ZNO PREPARED BY RF REACTIVE MAGNETRON SPUTTERING [J].

WEBB, JB ;

WILLIAMS, DF ;

BUCHANAN, M .

APPLIED PHYSICS LETTERS, 1981, 39 (08) :640-642

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