COMPARATIVE-STUDY OF AL2O3 OPTICAL CRYSTALLINE THIN-FILMS GROWN BY VAPOR COMBINATIONS OF AL(CH3)3/N2O AND AL(CH3)3/H2O2

被引:45
作者
KUMAGAI, H [1 ]
TOYODA, K [1 ]
MATSUMOTO, M [1 ]
OBARA, M [1 ]
机构
[1] KEIO UNIV,FAC SCI & TECHNOL,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 12B期
关键词
CHEMICAL VAPOR DEPOSITION; SURFACE CHEMICAL REACTION; AL2O3; VARIABLE-ANGLE SPECTROSCOPIC ELLIPSOMETRY; TRIMETHYLALUMINUM; NITROUS OXIDE; HYDROGEN PEROXIDE;
D O I
10.1143/JJAP.32.6137
中图分类号
O59 [应用物理学];
学科分类号
摘要
We compared the use of nitrous oxide (N2O) and hydrogen peroxide (H2O2) as the.oxidant in digital chemical vapor deposition to obtain high-quality optical crystalline thin films of Al2O3. Optical constants and thicknesses of these films were investigated in terms of growth temperature, by using variable-angle spectroscopic ellipsometry.
引用
收藏
页码:6137 / 6140
页数:4
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