INTERACTION OF AL LAYERS WITH POLYCRYSTALLINE SI

被引:80
作者
NAKAMURA, K
NICOLET, MA
MAYER, JW
BLATTNER, RJ
EVANS, CA
机构
[1] CALTECH,PASADENA,CA 91125
[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
关键词
D O I
10.1063/1.321530
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4678 / 4684
页数:7
相关论文
共 18 条
[1]  
BELLIER SP, 1973, SEMICONDUCTOR SILICO, P304
[2]   DETERMINATION OF CONCENTRATION PROFILE IN THIN METALLIC-FILMS - APPLICATIONS AND LIMITATIONS OF HE+ BACKSCATTERING [J].
CAMPISANO, SU ;
FOTI, G ;
GRASSO, F ;
RIMINI, E .
THIN SOLID FILMS, 1975, 25 (02) :431-440
[3]   MEASUREMENT OF SOLUBILITY OF GERMANIUM IN ALUMINUM UTILIZING MEV HE+ BACKSCATTERING [J].
CAYWOOD, JM .
METALLURGICAL TRANSACTIONS, 1973, 4 (03) :735-743
[4]  
CHANG CC, 1974, CHARACTERIZATION SOL
[5]   PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS [J].
CHU, WK ;
MAYER, JW ;
NICOLET, MA ;
BUCK, TM ;
AMSEL, G ;
EISEN, F .
THIN SOLID FILMS, 1973, 17 (01) :1-41
[6]  
CZEPREGI L, COMMUNICATION
[7]  
Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700
[8]  
HERD SR, 1972, J NONCRYSTAL SOLIDS, V7, P309, DOI DOI 10.1016/0022-3093(72)90267-0
[9]   EVALUATION OF GLANCING ANGLE X-RAY-DIFFRACTION AND MEV HE-4 BACKSCATTERING ANALYSES OF SILICIDE FORMATION [J].
LAU, SS ;
CHU, WK ;
MAYER, JW ;
TU, KN .
THIN SOLID FILMS, 1974, 23 (02) :205-213
[10]   DIFFUSIVITY AND SOLUBILITY OF SI IN AL METALLIZATION OF INTEGRATED CIRCUITS [J].
MCCALDIN, JO ;
SANKUR, H .
APPLIED PHYSICS LETTERS, 1971, 19 (12) :524-&