METAL VAPOR VACUUM-ARC ION SOURCES RADUGA

被引:20
作者
RYABCHIKOV, AI
DEKTJAREV, SV
STEPANOV, IB
机构
[1] Tomsk Polytechnic University
关键词
D O I
10.1063/1.1144766
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A brief review is presented of the ''Raduga'' 1-4 repetitively pulsed metal vapor vacuum arc ion sources. Their operation principles and functional ranges are described. The Raduga ion sources provide single- and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion fluxes, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion irradiation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. Some specific features of the emission properties of broad beam metal vapor vacuum arc ion sources are described.
引用
收藏
页码:3126 / 3134
页数:9
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