SILICON OXYGEN COMPLEXES CONTAINING 3 OXYGEN-ATOMS AS THE DOMINANT THERMAL DONOR SPECIES IN HEAT-TREATED OXYGEN-CONTAINING SILICON

被引：24
作者：
OEHRLEIN, GS
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 09期
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D O I：
10.1063/1.332728
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：5453 / 5455
页数：3
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