DIAGNOSTICS AND MODELING OF A METHANE PLASMA USED IN THE CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-CARBON FILMS

被引：220

作者：

TACHIBANA, K

NISHIDA, M

HARIMA, H

URANO, Y

机构：

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1984年 / 17卷 / 08期

关键词：

D O I：

10.1088/0022-3727/17/8/026

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1727 / 1742

页数：16

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