DIAGNOSTICS AND MODELING OF A METHANE PLASMA USED IN THE CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-CARBON FILMS

被引：220
作者：
TACHIBANA, K
NISHIDA, M
HARIMA, H
URANO, Y
机构：
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1984年 / 17卷 / 08期
关键词：
D O I：
10.1088/0022-3727/17/8/026
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1727 / 1742
页数：16
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