A NEW VUV-REFLECTOMETER FOR UHV-APPLICATIONS

被引：25

作者：

HOGREFE, H ^{[1
]}

GIESENBERG, D ^{[1
]}

HAELBICH, RP ^{[1
]}

KUNZ, C ^{[1
]}

机构：

[1] DESY,HAMBURGER SYNCHROTRONSTRAHLUNGSLAB,D-2000 HAMBURG 52,FED REP GER

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 208卷 / 1-3期

关键词：

D O I：

10.1016/0167-5087(83)91160-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

REFLECTOMETERS

引用

页码：415 / 418

页数：4

共 12 条

[1] UHV APPLICATION OF SPRING-LOADED TEFLON SEALS [J].

AUERBACH, DJ ;

BECKER, CA ;

COWIN, JP ;

WHARTON, L .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (11) :1518-1519

[2] GRAZING INCIDENCE VACUUM ULTRAVIOLET MONOCHROMATOR WITH FIXED EXIT SLIT [J].

DIETRICH, H ;

KUNZ, C .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1972, 43 (03) :434-&

[3] AUTOMATIC CONCENTRIC SHAFT REFLECTOMETER FOR USE IN VACUUM UV [J].

EMERSON, LC ;

COX, JT ;

OSTROM, GL ;

PAINTER, LR ;

CUNNINGHAM, GH .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1976, 47 (09) :1065-1068

[4] MULTILAYER INTERFERENCE MIRRORS FOR XUV RANGE AROUND 100 EV PHOTON ENERGY [J].

HAELBICH, RP ;

KUNZ, C .

OPTICS COMMUNICATIONS, 1976, 17 (03) :287-292

[5] EFFICIENCY OF HOLOGRAPHIC LAMINAR GRATINGS AND RULED BLAZED GRATINGS IN WAVELENGTH RANGE 55-560-A [J].

HAELBICH, RP ;

KUNZ, C ;

RUDOLPH, D ;

SCHMAHL, G .

NUCLEAR INSTRUMENTS & METHODS, 1978, 152 (01) :127-131

[6]

HAELBICH RP, 1977, PHYS DATA ZAED KARLS, V8

[7]

HAGEMANN HJ, 1975, J OPT SOC AM, V65, P742, DOI 10.1364/JOSA.65.000742

[8] ON CAUSE OF ERRORS IN REFLECTANCE VS ANGLE OF INCIDENCE MEASUREMENTS AND DESIGN OF REFLECTOMETERS TO ELIMINATE ERRORS [J].

HUNTER, WR .

APPLIED OPTICS, 1967, 6 (12) :2140-&

[9]

JARK W, 1982, UNPUB SRI C HAMBURG

[10]

POLASCHEGG HD, 1975, VAKUUM-TECH, V24, P136

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