SIMPLE-MODEL FOR ETCHING

被引：28

作者：

BLONDER, GE

机构：

来源：

PHYSICAL REVIEW B | 1986年 / 33卷 / 09期

关键词：

D O I：

10.1103/PhysRevB.33.6157

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6157 / 6168

页数：12

共 15 条

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[8] A GENERAL SIMULATOR FOR VLSI LITHOGRAPHY AND ETCHING PROCESSES .2. APPLICATION TO DEPOSITION AND ETCHING [J].

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