COMPUTER-CONTROLLED INGAAS-LPE IN THE TEMPERATURE-RANGE OF 500-600-DEGREES-C

被引：0

作者：

EISELE, H ^{[1
]}

BENZ, KW ^{[1
]}

机构：

[1] UNIV STUTTGART,INST PHYS,KRISTALLAB,D-7000 STUTTGART 80,FED REP GER

来源：

ZEITSCHRIFT FUR KRISTALLOGRAPHIE | 1984年 / 167卷 / 3-4期

关键词：

D O I：

暂无

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：196 / 197

页数：2

共 50 条

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[26] THE ULTRASTRUCTURE OF HUMAN DENTAL ENAMEL HEAT-TREATED IN THE TEMPERATURE-RANGE 200-DEGREES-C TO 600-DEGREES-C [J].

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[28] COMPRESSIBILITY OF TETRAFLUOROMETHANE IN THE TEMPERATURE-RANGE FROM 0-DEGREES-C TO 60-DEGREES-C AT PRESSURES FROM 20-BAR TO 70-BAR INVESTIGATED USING A COMPUTER-CONTROLLED EXPANSION APPARATUS [J].

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[29] LPCVD OF SILICON-OXIDE FILMS IN THE TEMPERATURE-RANGE 410-DEGREES-C TO 600-DEGREES-C FROM DIACETOXYDITERTIARYBUTOXYSILANE [J].

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[30] VIBRATIONAL RELAXATION OF HF IN TEMPERATURE-RANGE 600-2400 DEGREES K [J].

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