SUBSTRATE TREATMENT AND FILM DEPOSITION IN IONIZED AND ACTIVATED GAS

被引：23

作者：

HOLLAND, L ^{[1
]}

机构：

[1] UNIV SUSSEX,SCH MATH & PHYS SCI,FALMER,SUSSEX,ENGLAND

来源：

THIN SOLID FILMS | 1975年 / 27卷 / 02期

关键词：

D O I：

10.1016/0040-6090(75)90026-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：185 / 203

页数：19

共 45 条

[1] PRODUCTION OF VERY THIN FILMS OF STEARIC AND MELISSIC ACID BY CONTROLLED EVAPORATION IN VACUUM [J].

BAKER, MA .

THIN SOLID FILMS, 1971, 8 (03) :R13-&

[2] PLASMA DIAGNOSTICS AND ENERGY TRANSPORT OF A DC DISCHARGE USED FOR SPUTTERING [J].

BALL, DJ .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (07) :3047-&

[3]

BEAN DA, 1972, THESIS SUSSEX U

[4] ULTRAVIOLET DEPOLYMERIZATION OF PHOTORESIST POLYMERS [J].

BOLON, DA ;

KUNZ, CO .

POLYMER ENGINEERING AND SCIENCE, 1972, 12 (02) :109-&

[5] EFFECT OF ULTRAVIOLET IRRADIATION ON OPTICAL PROPERTIES OF SILICON OXIDE FILMS [J].

BRADFORD, AP ;

HASS, G ;

MCFARLAND, M ;

RITTER, E .

APPLIED OPTICS, 1965, 4 (08) :971-+

[6] INCREASING FAR-ULTRAVIOLET REFLECTANCE OF SILICON-OXIDE-PROTECTED ALUMINUM MIRRORS BY ULTRAVIOLET IRRADIATION [J].

BRADFORD, AP ;

HASS, C .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1963, 53 (09) :1096-+

[7]

BRADFORD AP, 1964, J OPT SOC AM, V54

[8]

BUTLER A, 1974, AM SOC LUBR ENGRS, V30, P59

[9]

CHAMBERS DL, 1971, RES DEV MAY, P32

[10] ELECTRON TEMPERATURE IN AN AC GLOW DISCHARGE IN AIR [J].

CHANDRAKAR, K .

BRITISH JOURNAL OF APPLIED PHYSICS, 1965, 16 (04) :449-+

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