PHONON-LIMITED RESONANT 2-PHONON RELAXATION PROCESS - CONCENTRATION-DEPENDENCE FOR CE3+ IN LA2MG3(NO3)12 24H2O AT 4.2 K

被引：6

作者：

LICHTI, RL ^{[1
]}

CULVAHOUSE, JW ^{[1
]}

机构：

[1] UNIV KANSAS, DEPT PHYS & ASTRON, LAWRENCE, KS 66044 USA

来源：

PHYSICAL REVIEW B | 1974年 / 9卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.9.4816

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：4816 / 4823

页数：8

共 20 条

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