CHEMICAL VAPOR-DEPOSITION OF RUTILE FILMS

被引：33

作者：

HAYASHI, S ^{[1
]}

HIRAI, T ^{[1
]}

机构：

[1] TOHOKU UNIV,IRON STEEL & OTHER MET RES INST,SENDAI,MIYAGI 980,JAPAN

来源：

JOURNAL OF CRYSTAL GROWTH | 1976年 / 36卷 / 01期

关键词：

D O I：

10.1016/0022-0248(76)90228-1

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：157 / 164

页数：8

共 28 条

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[10] GROWTH CHARACTERISTICS OF RUTILE FILM BY CHEMICAL VAPOR DEPOSITION [J].

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