DIELECTRIC-BREAKDOWN STUDY OF THIN LA2O3 FILMS

被引:13
作者
SINGH, A
机构
关键词
D O I
10.1016/0040-6090(83)90205-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:163 / 168
页数:6
相关论文
共 34 条
[1]   THICKNESS DEPENDENCE OF BREAKDOWN FIELD IN THIN FILMS [J].
AGARWAL, VK ;
SRIVASTAVA, VK .
THIN SOLID FILMS, 1971, 8 (05) :377-+
[2]  
AUSTEN EW, 1940, P PHYS SOC LOND A, V176, P33
[3]  
BUDENSTEIN PP, 1968, J VAC SCI TECHNOL, V6, P289
[4]  
Campbell C. K., 1970, Thin Solid Films, V6, P197, DOI 10.1016/0040-6090(70)90039-8
[5]   DIELECTRIC-PROPERTIES OF ELECTRON-BEAM-EVAPORATED ND2O3 THIN-FILMS [J].
DHARMADHIKARI, VS ;
GOSWAMI, A .
THIN SOLID FILMS, 1982, 87 (02) :119-126
[6]   ELECTRICAL BREAKDOWN IN THIN DIELECTRIC FILMS [J].
FORLANI, F ;
MINNAJA, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :518-+
[7]   THICKNESS INFLUENCE IN BREAKDOWN PHENOMENA OF THIN DIELECTRIC FILMS [J].
FORLANI, F ;
MINNAJA, N .
PHYSICA STATUS SOLIDI, 1964, 4 (02) :311-324
[8]  
FRANZ W, 1956, HDB PHYSIK, V17, P155
[10]  
FROMHOLD AT, 1976, ELECTROCOMP SCI TECH, V3, P31