EVALUATION OF III-V-SEMICONDUCTOR WAFERS USING NONDESTRUCTIVE ORGANIC-ON-INORGANIC CONTACT BARRIERS

被引：12
作者：
FORREST, SR
KAPLAN, ML
SCHMIDT, PH
GATES, JV
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 08期
关键词：
D O I：
10.1063/1.335226
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2892 / 2895
页数：4
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