REACTIVE-ION ETCHING OF 0.2-MU-M PERIOD GRATINGS IN TUNGSTEN AND MOLYBDENUM USING CBRF3

被引：25

作者：

SCHATTENBURG, ML

PLOTNIK, I

SMITH, HI

机构：

[1] MIT,CTR SPACE RES,CAMBRIDGE,MA 02139

[2] MIT,DEPT ELECT ENGN & COMP SCI,CAMBRIDGE,MA 02139

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583244

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：272 / 275

页数：4

共 21 条

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